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For full details, click on picture, More Info button or Item ID in listings below.
Added  Offered (box) or Wanted (coins)  Item ID  Short Description Product Type / Details # Price Notes
Make Model
   
Dec 22 195944

Applied Materials  

xR200S 

List all items of this typeHigh Current Implanters

in Ion Implantation Equipment

1   N*
APPLIED xR200S:
High Current Implanter it is in production for the next 6 month and it is in a very good condition.
Dec 22 195943

Applied Materials  

Applied 9500xR 

List all items of this typeHigh Current Implanters

in Ion Implantation Equipment

1   N*
Applied 9500xR:
High Current Implanter it is in production for the next 6 month and it is in a very good condition.
Dec 7 195768

Dainippon Screen  

SCW-60A-AV 

List all items of this typeManual Photoresist Coaters

in Photoresist Coaters

1   F*N*
Dainippon Screen Coater:
Coater with 2 Coatercups
Dec 7 195767

Dainippon Screen  

SDW-60A-AVP 

List all items of this typeManual Photoresist Developers

in Photoresist Developers

1   N*
Dainippon Screen Developer:
Developer with 2 Developercups
Dec 1 195697

Applied Materials  

0010-20276 

List all items of this typeWafer Production Equipment - Other

in Production Equipment

1   F*N*
Centura HP PVD:
Single wafer sputter tool
4 chambers
2x chambers: Wide body chambers
2x chambers: Standard chambers
Nov 27 195636

Applied Materials  

P5000 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   F*N*
AMAT P5000:
Mainframe with four chambers   200mm
Nov 27 195630

Applied Materials  

P5000 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   F*N*
AMAT P5000:
Mainframe with three chambers 200mm


*  Vendor Role: Mfr is Manufacturer; Sup is Supplier/Distributor; OEM is Original Equipment Manufacturer

NOTE:
   photo available
   reference document attached
  F* if the item is specially featured
  N* if the item is newly added, and/or
  R* if the item's price is recently reduced.